Semiconductor Engineering

Process Variation Analysis Of Device Performance Using Virtual Fabrication — Methodology Demonstrated On A CMOS 14-nm FinFET Vehicle

A new methodology to assess the impact of fabrication inherent process variability on 14-nm fin field effect transistor (FinFET) device performance. August 18th, 2021 - By: Coventor A new methodology ...
Electronic Design

Surface-Micromachined CMOS Process Enhances IC Tire-Pressure Sensor

An innovative design by Motorola's Sensor Products Division in Tempe, Ariz., optimally integrates a surface-micromachined capacitive automotive tire-pressure sensor with a 0.8-µm CMOS double-metal, ...
TechNewsWorld

Luxtera Delivers CMOS Photonics Technology

Fabless semiconductor company Luxtera announced today that it has solved the longstanding problem of building advanced photonic interfaces into mass-produced silicon chips. The company claimed that, ...
Semiconductor Engineering

Flexible-Wafer Platform And CMOS-Compatible 300mm Wafer-Scale Integrated-Photonics Fabrication

A new technical paper titled “Mechanically-flexible wafer-scale integrated-photonics fabrication platform” was published by researchers at MIT and New York Center for Research, Economic Advancement, ...