FREMONT, Calif.–Therma-Wave Inc. today announced the first critical dimension (CD) metrology tool that combines spectroscopic ellipsometry technology for high levels of optical measurement with ...

Spectroscopic ellipsometry based on photoelastic modulation delivers very high accuracy and repeatability. Owing to this technology the UVISEL allows the unique combination of high performance and ...

This free of charge workshop is aimed at both experienced ellipsometry users as well as people new to ellipsometry. The format of the workshop includes an introduction, fundamentals of ellipsometric ...

In certain instances, direct access to a structure being studied may not be possible due to mechanical constraints, such as device packaging or limitations related to the samples themselves. To ...

Optical characterisation of thin films is a critical field that bridges fundamental research and application in materials science and engineering. It encompasses the use of various spectroscopic ...

A new technical paper titled “Ultra-wide-field imaging Mueller matrix spectroscopic ellipsometry for semiconductor metrology” was published by researchers at Samsung. “We propose an ultra-wide-field ...

Let us help you with your inquiries, brochures and pricing requirements Request A Quote Download PDF Copy Download Brochure The Accurion EP4, the latest imaging ...