ASML PAS 5500/300C DUV Wafer Stepper Training Video
ASML PAS 5500/300C DUV Wafer Stepper Training Video
Oct 15, 2020
cornell.edu
Fire the “la-ser”! Our most advanced DUV lithography systems use argonfluoride (ArF) excimer lasers that produce light with a wavelength of 193 nanometer. | ASML
0:21
Fire the “la-ser”! Our most advanced DUV lithography system…
331 viewsNov 23, 2021
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29 reactions | DUV is the backbone of chip manufacturing, so it's worth taking a closer look at this constantly evolving technology. Over the next few weeks we'll take you on a DUV deep dive - stay tuned! | ASML | Facebook
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29 reactions | DUV is the backbone of chip manufacturing, so it's wort…
533 views1 week ago
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ASML Developing Next-Gen EUV Lithography
ASML Developing Next-Gen EUV Lithography
Dec 5, 2018
ieee.org
ASML Competitors: Is ASML the Only EUV Company? - Value of Stocks
ASML Competitors: Is ASML the Only EUV Company? - Value of St…
Mar 27, 2022
valueofstocks.com
4.4K views · 110 reactions | ASML engineers and technicians work in a high-tech environment where cleanroom processes, module builds, and hands-on training come together to produce the world’s most advanced lithography systems used in semiconductor production. | ASML | Facebook
1:23
4.4K views · 110 reactions | ASML engineers and technicians work i…
1.8K views1 week ago
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【ASML週報｜成熟當道💡：DUV 機台的應用】 ASML 透過微影技術的創新成為半導體產業發展的一份助力，EUV 極紫外光技術滿足更小型、高效能晶片的需求。然而，我們不可忽視的是，成熟製程需求也在持續上升中。手機📱、電動汽車🚗、太陽能板☀等產品配備的晶片，不一定需要最先進的晶片技術，且在生活中隨處可見，這樣的晶片即可以利用乾式 DUV 微影機台製作🧑‍🔬。 #乾式DUV是什麼 乾式 DUV 微影機台使用波長 193 至 365 奈米之間的深紫外光進行曝光。機台能夠將光罩上的微細圖案縮小四倍，並將其投影到晶圓上，實現高精度的圖案轉移🔦。 #ASML如何滿足晶片製造商的需求 ASML 一直致力於研究和開發下一代乾式微影設備，並且不斷改進、優化和升級機台，同時回購和翻新舊的 PAS 和 XT 系統，以確保它們保持在最新的技術⚡。此外，我們也能夠根據客戶的需求進行量身訂製，包括不同材料選擇、晶圓尺寸和封裝選項，以處理各種不同的晶圓尺寸和厚度。新一代的乾式微影技術將會對生產電源晶片尤其重要❗，這類晶片負責管理、控制輸入電壓及輸出電流變化保持穩定，在手機、筆電和電動車等裝置中都需要它
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